Nanoparticle Deposition RF Atom Sources for atomic oxygen and atomic nitrogen Mini E-beam evaporators RF Ion Sources Thermal atomic oxygen and atomic hydrogen source Deposition systems

 
Nanoparticle deposition Source

At Mantis Deposition we offer a complementary range of instruments for the deposition and characterisation of nanoparticles. Our instruments allow precise beams of size-selected nanoparticles to be generated from almost any elemental or alloy base material. In addition, reactive particle generation allows oxide or nitride compound nanoclusters to be deposited. We can offer instruments for retrofit to existing vacuum chambers or complete system solutions for nanoparticle film growth.

 

The Nanogen-50 nanocluster source uses a unique high-pressure sputtering source to generate nanoparticles within a condensation zone. The gas flow characteristics within the condensation zone ensures refinement of the size distribution of the beam to allow precise definition of the particle size in the emergent beam. The unique configuration of the condensation zone also maximises the ratio of nanoparticle to carrier gas entering the main deposition chamber. The source can be supplied with user-selectable refinement zones to suit particular applications.  Nanoparticles can be generated with as few as 30 atoms up to those with diameters exceeding 15nm.

Soft-landing vs accelerated impact
 The Nanogen source produces a high percentage of ionised nanoparticles (up to 40%). Under normal running conditions, the particles, both neutral and ionised, emerge from the source with very low kinetic energy. This ensures that particles subsequently deposited on surfaces are 'soft-landed' and retain their nanocrystalline structure. Alternatively, the high degree of ionisation allows users to manipulate a large fraction of the particle beam electrostatically. It is possible to accelerate the ionised particles to a biased surface, for example, in order to impact the particles on the surface with elevated kinetic energy allowing partial or total interface mixing between the substrate and the particulate beam. Such accelerated beams can  be used to create highly adherent films on difficult materials such as untreated Teflon or glass at room temperature.

The MesoQ quadrupole mass filter can be used in-line with the NanoGen-50 to analyse and further filter the nanoparticle beam with throughput up to 10^6 amu. The quadruople has an ultimate size resolution of better than 2% in filtering mode, allowing precise particle size definition to be achieved. When used in conjunction with the Nanogen source, the MesoQ allows high-throughput in filter mode as a high proportion of the beam is naturally ionised. In conventional quarupole devices, the gases to be analysed must first be ionised prior to entry into the filter. The MesoQ is supplied as standard with software control for analysis from a Windows-based PC.

 

Mantis Deposition offers a complete nanoparticle deposition solution in the shape of a UHV-compatible deposition system. Users can either choose the standard configuration or customise the system according to their specific needs. At the heart of the system lies the NanoGen nanoparticle deposition source (see above) and the source positioning and ancillary chamber components have been specifically designed the maximise the operation of this source. The standard sample manipulator features sample heating, bias and rotation for 2 inch samples. Numerous ports are available for additional deposition sources to allow, for example, matrix encapsulation of nanoparticles for thin-film structures or devices as well as for viewports and optional sample-entry load-lock systems.