• Mantis Deposition Systems
  • Mantis Deposition Systems
  • Mantis Deposition Systems
  • Mantis Deposition Systems

M Series (MBE)

Chamber

The all new M Series range of platforms are based on our proven MBE system technology offering a very low and stable UHV performance for MBE researchers utilising a conflat flange platform.  The M Series range regardless of size and complexity use the same proven technology whilst offering optimised characteristics depending on research specialisation and budget.  All M Series platforms are controlled using our latest software control platform TITANIUM 10.

All joints are internally welded to reduce to an absolute minimum any outgassing.  
Depending on specification the chamber includes a wide array of in-situ analysis ports, such as ellipsometry, RGA and RHEED.  Base ports are confocal as standard allowing a wider variety and number of deposition sources to be employed for best possible thickness uniformity.  The M500-FLEX has been specifically designed to incorporate a multipocket UHV E-beam source, alongside a wide range of primary Kcell and atom sources

Applications

  • Semiconductor films
  • Oxides/Nitrides
  • Nanostructured films
  • Chalcogenides
  • Compound semiconductors
  • Ultra-thin films
  • New materials

M250-ORIGINM500-FLEXM500-CREATOR
Chamber diameterSample storage500mm (~20“)
Cryoshroud (optional)LN2 cryo panel (single walled) with phase separator connections (*)LN2 cryo panel (double walled) with phase separator connections (*)
In-situ analysis ports2 x DN100/63CF (6"/4.5” O.D.) e.g. RHEED
3 x DN40CF (2 ¾” O.D.) QCM, BFM (BEP), RGA
1 x DN63CF (4.5" O.D.) e.g. Atom Source
2 x DN100CF (6" O.D.) e.g. RHEED
4 x DN40CF (2 ¾” O.D.) in reflectance
(e.g. Ellipsometry)
3 x DN40CF (2 ¾” O.D.)  QCM, BFM (BEP), RGA
1 x DN63CF (4.5" O.D.) e.g. Atom Source
2 x DN100CF (6" O.D.) e.g. RHEED
4 x DN40CF (2 ¾” O.D.) in reflectance
(e.g. Ellipsometry)
3 x DN40CF (2 ¾” O.D.)  QCM, BFM (BEP), RGA
1 x DN63CF (4.5" O.D.) e.g. Atom Source
Chamber bakeoutHeater tapesFull bakeout tent Full bakeout tent
Default pumping arrangement265 l/s. turbo pump
3.3 cbm/h roughing pump
240 I/s. ion getter pump
Titanium sublimination pump
355 l/s. turbo pump
6.6 cbm/h roughing pump
400 I/s. ion getter pump
Titanium sublimination pump   
355 l/s. turbo pump
6.6 cbm/h roughing pump
400 I/s. ion getter pump
Titanium sublimination pump   
Ultimate base pressure<5 x 10-10mbar
   
<2 x 10-10mbar <2 x 10-10mbar
Sample storageSample storage cassette in load-lock for up to 5 samples
SoftwareTITANIUM automation software

 

Photo Credit

Jason Kawasaki, Assistant Professor, Materials Science and Engineering, University of Wisconsin-Madison, College of Engineering, transfers a sample into the molecular beam epitaxy system for film growth. Photo provided by: University of Wisconsin-Madison, College of Engineering External Relations.  Read more about this novel research.

 

 

Sample

The base system is equipped with a load-lock appropriately sized for the sample size and may include the option of sample storage.  Sample sizes are research specific and depending on model selected include FLAG, 2” and 4”, with a sample stage shutter.

Sample transfer is actuated via a magnetically-coupled transfer arm.  Sample hand-off is enabled via z-shift lift-off of the sample table.

All hot-zone components in a heated sample holder are manufactured of refractory materials in order to maintain system purity.

 

M250-ORIGINM500-FLEXM500-CREATOR

Sample size and
sample manipulation

FLAG-style +/-180° rotation,
900°C heating, LN2 cooling (optional)

1" to 2" wafers, continuous rotation
(20 RPM), 900°C (optional 1000°C)
Oxygen resistant (optional)


FLAG-style +/-180° rotation,
900°C heating, LN2 cooling (optional)

1" to 4" wafers, continuous rotation
(20 RPM), 900°C (optional 1000°C)
Oxygen resistant (optional)

 

FLAG-style +/-180° rotation,
900°C heating, LN2 cooling (optional)

1" to 4" wafers, continuous rotation
(20 RPM), 900°C (optional 1000°C)
Oxygen resistant (optional)

 

 

Components

ComCell Effusion Cell Source

ComCell K-cell sources for organics and mid temperature range metals will fit through standard ports and optional, water-cooled cross-contamination shields can be added around them to improve overall system purity.  More details on our MBE Kcells for metals and organics are available here.  In addition we offer a wide range of specialist MBE sources from our partners MBE Komponenten GmbH, typically for high temperature materials or materials which require multi-stage cracking.

Atomic Sources

For the growth of oxides or nitrides at low pressure, it is often necessary to use a more reactive form of oxygen (and certainly nitrogen) to form oxide or nitride compounds.  These can be incorporated to act alongside conventional metal deposition sources to grow high-quality compound layers.  More info can be found here.

E-Beam Sources

We offer two types of e-beam evaporation sources:

Mini E-Beam Sources for low dose, extreme thickness control

These are intended for highly-controlled, ultra-thin film deposition of refractory materials into the system. See more details here.

Multi kW Sources

These offer high deposition rate and high capacity and are available for the M500-FLEX platform as UHV single or multi-pocket sources.

 

M250-ORIGINM500-FLEXM500-CREATOR
ComCell Effusion Cell Sources or 3rd party Effusion CellsMax. 7 sources (effusion cells, (valved) crackers, mini E-Beam evaporators)Max. 7 sources (effusion cells, (valved) crackers, mini E-Beam evaporators)Max. 12 sources (effusion cells, (valved) crackers, mini E-Beam evaporators)
Atom/Ion SourceYesYesYes
UHV single or multi-pocket linear E-Beam EvaporatorNoYesNo

 

 

Accessories

Gauges
The system is configured as standard with full-range gauges to allow seamless pumpdown monitoring.
Ports can be included for RHEED, ellipsometry, residual gas analysers or thin film monitors.
As an option additional analysis equipment can be included at the user's request.

Automation
The system can be automated using touchscreen-based pumpdown or using process automation feature in in-house developed software.

 

Downloads