The formation of PtRu nanoclusters with different Pt:Ru ratios was further proved by the EDX analysis.
The patented NanoGenTrio source is a nanocluster source with multi-magnetron head capability. It includes a number of unique features which are critical to the generation of complex compound nanoparticles.
Similar to NanoGen50, the NanoGenTrio source provides a high level control of nanoparticle generation by varying three main process components: aggregation length, gas pressure and the power density applied to the target. However, in the contrast to NanoGen50 source, it also has three 1" coplanar sputter targets, which can be driven independently by three power supplies. This allows deposition of complex alloy nanoparticles due to rapid mixing of atomic vapour sputtered from different targets.
The precise gas flow control achieved by the gas flow channels on the periphery of each sputter target face ensures that the vapours generated on each target are mixed before they begin to seed into nanoparticles. In this way true compound nanoclusters are formed from different sputter materials.
Compound nanoparticles can be generated with as few as 30 atoms up to those with diameters close to 20 nm. In addition to being able to control the size of the particle, it is possible to vary the relative concentrations of the materials in the particle by independently altering the power applied to each magnetron target.
Figure below shows the results of the experiment where NanoGenTrio was equipped with Pt and Ru targets. When the power to the targets was varied, a significant change in the nanoparticle beam distribution was detected.
The strongest signal was recorded when full power was applied to both Ru and Pt targets. The mean particle diameter varied between 1.5-2nm.
The dark field image below shows the PtRu nanoparticles deposited on the substrate.